Nano-MAX® 36inch Polishing Machine NM-910V

It fits SMD surface crystal,optic crystal,optic glass,shaphire semiconductor silicon slice, quartz crystal slice, piezoelectricity porcelain, arsenide gallium,LiNb03, molybdenum slice and metal, nonmetal brittleness material  single side polishing and rubbing of pressurizing components.

Polishing is the removal of material to produce a scratch-free, specular surface using fine(＜3μm) abrasive particles. Polishing is typically done at very low speeds using either polishing cloths, abrasive films, or specially designed lapping plates. Polishing with a cloth or lapping plate requires the use of free abrasive, and is a very low damage process when performed properly. Plate material and cloth material are critical when polishing a particular sample as the properties of these substraes are important in the final polish quality of the specimen.

Polishing with a lapping plate is a common process used in the case of metals and hard ceramic type materials.Polishing using copper composie plates or tin/lead lapping plates can produce high quality surface finishes with high removal rates.In many cases the use of a polishing cloth is required, and thus the selection of a proper polishing cloth is important. Polishing cloth properties needed depend on the application.If flatness is of primary concern, short nap cloths(such as Nylon) are used to maintain flatness. When the final surface finish is of primary concern,longer napped cloths(such as Rayon and Silk) are used.Many cloth materials today combine the best of both worlds, allowing flatness and surface finish combined to provide maximum performance.Polyurethane pads are commonly used for final polishing processed and produce excellent flatness and surface finish.

Polishing with abrasive films also produces excellent results.The flatness of the films combined with high removal rates makes them an attractive alternative to cloth and plate polishing methods.